Plasma Electronics Applications in Microelectronic Device Fabrication

Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency.The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.

Introduction Plasma and Its Classification Application of Low Temperature Plasma Academic Fusion References Phenomenological Description of the Charged Particle Transport Transport in Real (Configuration) Space Momentum Balance of Electrons Energy Balance of Electrons Transport in Velocity Space Electron Velocity Distribution and Swarm Parameters Ion Velocity Distribution and Mean Energy Thermal Equilibrium and its Governing Relations Boltzmann Distribution in Real Space Maxwell Distribution in Velocity Space ReferencesMacroscopic Plasma CharacteristicsIntroductionQuasi NeutralityCharge separation In Plasmas Spatial Scale of Charge-Separation Time Scale for Charge-Separation Plasma Shielding Debye Shielding Metal Probe in a Plasma Particle Diffusion Ambipolar Diffusion Spatial and Time Scale of Diffusion Bohm Sheath Criterion Bohm Velocity Floating Potential References Elementary Processes in Gas Phase and on Surfaces Particles and Waves Particle Representation in Classical and Quantum Mechanics Locally Isolated Particle Group and Wave Packets Collisions and Cross Sections Conservation Laws in Collisions Definition of Collision Cross Sections The Distribution of Free Paths Representation of Collisions in Laboratory and CM Reference Frames Classical Collision Theory Scattering in Classical Mechanics Conditions for the Applicability of the Classical Scattering TheoryQuantum Theory Of Scattering Differential Scattering Cross Section s(?) Modified Effective Range Theory in Electron Scattering Collisions Between Electrons And Neutral Atoms/Molecules Resonant Scattering Electron–Atom Collisions Energy Levels of Atoms Electron–Atom Scattering Cross Sections Electron–Molecule Collisions Rotational, Vibrational, and Electronic Energy Levels of Molecules Rotational Excitation Rotational Energy Levels Rotational Excitation Cross Sections Vibrational Excitation Vibrational Energy Levels Vibrational Cross Sections Electronic Excitation and Dissociation Electronic States of Molecules Cross Sections for Electronic Excitation of Molecules Electron Collisions with Excited Atoms and Molecules Nonconservative Collisions of Electrons With Atoms and Molecules Electron-Induced Ionization Electron Attachment Dissociative Electron Attachment Nondissociative Electron Attachment Ion Pair Formation Electron Attachment to Excited Molecules Rate Coefficients for Attachment Electron–Ion and Ion–Ion Recombination Electron–Ion and Electron–Electron Collisions Heavy Particle Collisions Ion–Molecule Collisions Charge Transfer, Elastic, and Inelastic Scattering of Ions Ion–Molecule Reactions Collisions of Fast Neutrals Collisions of Excited Particles Chemi-Ionization and Penning Ionization Collisions of Slow Neutrals and Rate Coefficients Quenching and Transport of Excited States Kinetics of Rotational and Vibrational Levels Photons in Ionized Gases Emission and Absorption of Line Radiation Resonant Radiation Trapping Elementary Processes at Surfaces Energy Levels of Electrons in Solids Emission of Electrons from Surfaces Photo-Emission Thermionic Emission Field-Induced Emission Potential Ejection of Electrons from Surfaces by Ions and Excited Atoms Emission of Ions and Neutrals from Surfaces Surface Neutralization Surface Ionization AdsorptionReferencesThe Boltzmann Equation and Transport Equations of Charged Particles IntroductionThe Boltzmann Equation Transport in Phase Space and Derivation of the Boltzmann Equation Transport CoefficientsThe Transport Equation Conservation of Number Density Conservation of Momentum Conservation of Energy Collision Term In The Boltzmann Equation Collision Integral Collision Integral between an Electron and a Gas Molecule Elastic Collision Term Jelas Excitation Collision Term Jex Ionization Collision Term Jion Electron Attachment Collision Term Jatt Boltzmann Equation For Electrons Spherical Harmonics and Their Properties Velocity Distribution of Electrons Velocity Distribution under Uniform Number Density: g0 Velocity Distribution Proportional to ?rn(r, t): g1 Electron Transport Parameters References General Properties of Charged Particle Transport in Gases Introduction Electron Transport In DC Electric Fields Electron Drift Velocity Diffusion Coefficients Mean Energy of Electrons Excitation, Ionization, and Electron Attachment RatesElectron Transport in Radio Frequency Electric Fields Relaxation Time Constants Effective Field Approximation Expansion Procedure Direct Numerical Procedure Time-Varying Swarm ParametersIon Transport In Dc Electric Fields References Modeling of Nonequilibrium (Low Temperature) Plasmas IntroductionContinuum Models Governing Equations of a Continuum Model Local Field Approximation (LFA) Quasi-Thermal Equilibrium (QTE) Model Relaxation Continuum (RCT) Model Phase Space Kinetic Model Particle Models Monte Carlo Simulations (MCSs) Particle-in-Cell (PIC) and Particle-in-Cell/Monte Carlo Simulation (PIC/MCS) Models Hybrid ModelsCircuit Model Equivalent Circuit Model in CCP Equivalent Circuit Model in ICP Transmission-Line Model (TLM) Electromagnetic Fields and Maxwell’s Equations Coulomb’s Law, Gauss’s Law, and Poisson’s Equation Faraday’s Law Ampere’s Law Maxwell’s EquationsReferencesNumerical Procedure of Modeling Time Constant of the System Collision-Oriented Relaxation Time Plasma Species-Oriented Time Constant Plasma-Oriented Time Constant/Dielectric Relaxation TimeNumerical Techniques To Solve The Time Dependent DriftDiffusion Equation Time-Evolution Method Finite Difference Digitalization and Stabilization Time Discretization and Accuracy Scharfetter–Gummel Method Cubic Interpolated Pseudoparticle Method Semi-Implicit Method for Solving Poisson’s Equation Boundary Conditions Ideal Boundary — Without Surface Interactions Dirichlet Condition Neumann Condition Periodicity Condition Electrode Surface Metallic Electrode Dielectric Electrode Boundary Conditions with Charge Exchange Boundary Conditions with Mass Transport Plasma Etching Plasma Deposition Plasma Sputtering Moving Boundary under Processing References Capacitively Coupled PlasmaRadio Frequency Capacitive Coupling Mechanism of Plasma Maintenance Low-Frequency Plasma High-Frequency Plasma Electronegative Plasma Very High-Frequency PlasmaTwo-Frequency Plasma Pulsed Two-Frequency PlasmaReferencesInductively Coupled PlasmaRadio Frequency Inductive CouplingMechanism of Plasma Maintenance E-mode and H-mode Mechanism of Plasma Maintenance Effect of Metastables Function of ICP Phase Transition Between E-Mode and H-Mode in an ICPWave Propagation in Plasmas Plasma and Skin Depth ICP and the Skin Depth ReferencesMagnetically Enhanced PlasmaDirect Current Magnetron PlasmaUnbalanced Magnetron PlasmaRadio Frequency Magnetron Plasma Magnetic Confinements Of Plasmas Magnetically Resonant Plasmas References Plasma Processing and Related TopicsIntroduction Physical Sputtering Target Erosion Sputtered Particle Transport Plasma Chemical Vapor Deposition Plasma CVD Large-Area Deposition with High RatePlasma Etching Wafer Bias On Electrically Isolated Wafers (without Radio-Frequency Bias) On Wafers with Radio-Frequency Bias Selection of Feed Gas Si or Poly-Si Etching Al Etching SiO2 Etching Feature Profile Evolution Plasma Bosch Process Charging Damage Surface Continuity and Conductivity Charging Damage to Lower Thin Elements in ULSI Thermal Damage Specific Fabrication of MOS Transistor Gate Etching Contact Hole Etching Low-K Etching MEMS Fabrication References Atmospheric Pressure, Low Temperature Plasma High Pressure, Low Temperature Plasma Fundamental Process Historical Development Micro Plasma Radiofrequency Atmospheric Micro-Plasma Source Gas Heating in a Plasma Effect of Local Gas Heating ReferencesIndex

Toshiaki Makabe received his BSc, MSc, and Ph.D. degrees in electrical engineering all from Keio University. He became a Professor of Electronics and Electrical Engineering in the Faculty of Science and Technology at Keio University in 1991. He also served as a guest professor at POSTECH, Ruhr University Bochum, and Xi’an Jiaotong University. He was Dean of the Faculty of Science and Technology and Chair of the Graduate School from 2007 to 2009. Since 2009, he has beenthe Vice-President of Keio University in charge of research. He has published more than 170 papers in peer-reviewed international journals, and has given invited talks at more than 80 international conferences in the field of non-equilibrium, low-temperature plasmas and related basic transport theory, and surface processes. He is on the editorial board of Plasma Sources Science and Technology, and many times he has been a guest editor of the special issue about the low temperature plasma and the surface process of the Japanese Journal of Applied Physics, Australian Journal of Physics, Journal of Vacuum Science and Technology A, IEEE Transactions on Plasma Science, and Applied Surface Science, etc. He received the awards; "Fluid Science Prize" in 2003 from the Institute of Fluid Science, Tohoku University, "Plasma Electronics Prize" in 2004 from the Japan Society of Applied Physics, "Plasma Prize" in 2006 from the American Vacuum Society, etc. He is an associate member of the Science Council of Japan, and a foreign member of the Serbian Academy of Sciences and Arts. He is a fellow of the Institute of Physics, the American Vacuum Society, the Japan Society of Applied Physics, and the Japan Federation of Engineering Societies. Zoran Lj. Petrovic obtained his Master’s degree in the Department of Applied Physics, Faculty of Electrical Engineering in the University of Belgrade, and earned his Ph.D from Australian National University. He is the Head of the Department of Experimental Physics in the Institute of Physics, University of Belgrade. He has taught postgraduate courses in microelectronics, plasma kinetics and diagnostics and was a visiting professor in Keio University (Yokohama, Japan). He has received the Nikola Tesla award for technological achievement and the Marko Jaric Award for Great Achievement in Physics. He is a full member of the Academy of Engineering Sciences of Serbia and Serbian Academy of Sciences and Arts where he chairs the department of engineering science. Zoran Petrovic is a fellow of American Physical Society, vice president of the National Scientific Council of Serbia, and president of the Association of Scientific Institutes of Serbia. He is a member of editorial boards of Plasma Sources Science and Technology and Europena Physical Journal D. He has authored or co-authored over 220 papers in leading international scientific journals, and has given more than 90 invited talks at professional conferences. His research interests include atomic and molecular collisions in ionized gases, transport phenomena in ionized gases, gas breakdown, RF and DC plasmas for plasma processing, plasma medicine, positron collisions and traps, and basic properties of gas discharges.

Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory.
Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences.
A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency.
The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor.
Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.