Nanofabrication by Ion-Beam Sputtering Fundamentals and Applications

Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation parameters in order to create desired surface morphologies on specific materials.

Elements of Sputtering Theory, Peter SigmundIntroductionGeneral aspectsHigh-energy cascade dynamicsInputLow-energy dynamicsConcluding remarksSputter-Ripple Formation on Flat and Rough Surfaces – A Case Study with Si, S.A. Mollick and D. Ghose IntroductionMechanisms of pattern formationSample preparation and analysisResults and discussionConclusionsLow Energy Ion Induced Pattern Formation in Si-Ge Alloy, Subhendu SarkarIntroductionTheoretical aspectsPatterning of alloy surfacesStudies on SiGe surfacesIon beam effectsConclusion and outlookPatterning of Ionic Insulator Surfaces with Low Energy Ion Beams, Franciszek Krok, Salah R. Saeed, Marek Kolmer, and Marek SzymonskiIntroductionRemarks on experimental detailsSurface morphology changes at the initial stages of ion bombardmentRipple formation for prolonged irradiation with off normal incidence ion beamTemperature dependent patterning of ionic single crystal surfacesElectronic versus ballistic processes on ion irradiated ionic surfacesConcluding remarksNanostructures of Thin Films by keV Ion Beams, Prasanta KarmakarIntroductionVariation of surface patternsOrigin of ion induced nanostructure formationDependence on local ion impact angleSpatially resolved magnetic and electric zone formationCoulomb explosion sputtering of spatially oxidized nanostructuresSummarySurface Nanopatterns on Si(100) by Normal-Incidence Ion Sputtering with Metal Incorporation, Raúl Gago, José A. Sánchez-García, Andrés Redondo-Cubero, and Luis VázquezIntroductionExperimentNanopattern formation with a cold-cathode ion sourceRole of metal incorporation on the pattern selectivityOn the mechanism of pattern selectivity and outlookConclusionsKinetic Monte Carlo Simulations of Low Energy Ion-Induced Surface Patterning, Wai-Lun Chan and Eric ChasonIntroductionKMC modelRipples formation in the linear instability regimeDependence of ripple wavelength on temperature and ion fluxBarrier for ripples formation in the low flux and high temperature regimeEffect of multiple defectsConclusionsFrom Cascades to Patterns: A Monte Carlo Approach, Reiner Kree and Taha YasseriIntroductionLessons from BCA and Kinetic TheoryBasic Monte Carlo modelVariants and refinementsConclusionsUnderstanding Surface Patterning By Lattice Gas Models, Géza Ódor, Bertosz Liedke, and Karl-Heinz HeinigIntroductionMapping of surface adsorption or desorption onto lattice gasesNumerical simulation for Kardar-Parisi-Zhang (KPZ)The surface diffusion model in 2DPattern generation by competing inverse MH and KPZ processesKPZ in the presence of normal surface diffusionConclusion and outlookApplications of Ion Induced Patterned Substrates in Plasmonics, Mukesh Ranjan, Thomas W. H. Oates, and Stefan FacskoIntroduction: Demand of plasmonicsScaling laws to produce ripple templates for plasmonic application Metal film growth on rippled templates by PVD methods Plasmonic properties Conclusions

Tapobrata Som, Dinakar Kanjilal