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bowen d.k. (curatore); gilfrich john v. (curatore); goldsmith c.c. (curatore); huang ting c. (curatore); jenkins ron (curatore); noyan i. cev (curatore); predecki paul k. (curatore); smith deane k. (curatore) - advances in x-ray analysis
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Advances in X-Ray Analysis Volume 38

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Dettagli

Genere:Libro
Lingua: Inglese
Editore:

Springer

Pubblicazione: 09/1995
Edizione: 1995





Trama

The 43rd Annual Conference on Applications ofX-ray Analysis was held August 1-5, 1994, at the Sheraton Steamboat Resort & Conference Center in Steamboat Springs, Colorado. The Denver X-Ray Conference has evolved from the 1950's into an international forum for the interaction of scientists, engineers and technologists interested in the use of x-rays in materials characterization. It has not only acted as a venue but has both stimulated and nurtured many of the principal developments in this field over the years. The major changes that have been occurring on the national and international scene as a result of the end of the cold war have dramatic-ally affected the way the materials community does business. The removal of defense priorities and development funds from most new materials initiatives has stimulated the char­ acterization communities to look to increasing the speed of their methods. This is being accom­ plished via the development of very fast dynamic characterization procedures which can rapidly and intelligently monitor and optimize the formation of a desired microstructure. The develop­ ment of intelligent characterization procedures applied in real-time during the manufacturing process can lead to the ability to design desired microstructures. Another potential advantage to this approach is its ability to characterize the actual amount of material which goes into a final product; permitting a rapid transition from R&D to manufacturing by avoiding the prob­ lems associated with scale-up.




Sommario

I. Dynamic Characterization of Materials by Powder Diffraction.- II. Phase Analysis, Accuracy and Standards in Powder Diffraction.- III. Applications of Diffraction to Semiconductors and Films.- IV New Developments in X-Ray Sources, Instrumentation and Techniques.- V. Residual Stress, Crystallite Size and Rms Strain Determination by Diffraction Methods.- VI. Polymer Applications of X-Ray Scattering.- VII. Microbeam Xrd and Xrs Analysis.- VIII. In Vivo Applications of Xrs.- IX. Xrs Mathematical Methods, Trace Analysis and Other Applications.- X. Structural and Other Applications of Powder Diffraction.- Author Index.










Altre Informazioni

ISBN:

9780306450457

Condizione: Nuovo
Dimensioni: 254 x 178 mm
Formato: Copertina rigida
Illustration Notes:XXVI, 787 p.
Pagine Arabe: 787
Pagine Romane: xxvi


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