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fasching franz (curatore); halama stefan (curatore); selberherr siegfried (curatore) - technology cad systems

Technology CAD Systems

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Lingua: Inglese


Pubblicazione: 01/2012
Edizione: Softcover reprint of the original 1st ed. 1993


As the cost of developing new semiconductor technology at ever higher bit/gate densities continues to grow, the value of using accurate TCAD simu­ lation tools for design and development becomes more and more of a necessity to compete in today's business. The ability to tradeoff wafer starts in an advanced piloting facility for simulation analysis and optimization utilizing a "virtual fab" S/W tool set is a clear economical asset for any semiconductor development company. Consequently, development of more sophisticated, accurate, physics-based, and easy-to-use device and process modeling tools will receive continuing attention over the coming years. The cost of maintaining and paying for one's own internal modeling tool development effort, however, has caused many semiconductor development companies to consider replacing some or all of their internal tool development effort with the purchase of vendor modeling tools. While some (noteably larger) companies have insisted on maintaining their own internal modeling tool development organization, others have elected to depend totally on the tools offered by the TCAD vendors and have consequently reduced their mod­ eling staffs to a bare minimal support function. Others are seeking to combine the best of their internally developed tool suite with "robust", "proven" tools provided by the vendors, hoping to achieve a certain synergy as well as savings through this approach. In the following sections we describe IBM's internally developed suite of TCAD modeling tools and show several applications of the use of these tools.


Technology CAD at AT&T.- Technology CAD at IBM.- Technology CAD at Intel.- Perspective on TCAD Integration at Berkeley.- A TCAD Framework for Development and Manufacturing.- Technology CAD at Stanford University.- An Integrated Design Environment for Semiconductors.- The SATURN Technology CAD System.- The STORM Technology CAD System.- The Viennese Integrated System for Technology CAD Applications.- Technology CAD at NEC.- Technology CAD at OKI.- The MASTER Framework.- CAESAR: The Virtual IC Factory as an Integrated TCAD User Environment.- Author Index.

Altre Informazioni



Condizione: Nuovo
Dimensioni: 244 x 170 mm Ø 562 gr
Formato: Brossura
Illustration Notes:VIII, 309 p.
Pagine Arabe: 309
Pagine Romane: viii

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