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Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems.
The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text.
The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.
PART VII - INSTRUMENTAL OPTICS 35. Electrostatic Lenses 36. Magnetic Lenses 37. Electron Mirrors, Low-energy-electron Microscopes and Photoemission Electron Microscopes, Cathode Lenses and Field-emisssion Microscopy 38. The Wien Filter 39. Quadrupole Lenses 40. Deflection Systems
PART VIII - ABERRATION CORRECTION AND BEAM INTENSITY DISTRIBUTION (CAUSTICS) 41. Aberration Correction 42. Caustics and their Applications
PART IX - ELECTRON GUNS 43. General Features of Electron Guns 44. Theory of Electron Emission 45. Pointed Cathodes without Space Charge 46. Space Charge Effects 47. Brightness 48. Emittance 49. Gun optics 50. Complete Electron Guns
PART X - SYSTEMS WITH A CURVED OPTIC AXIS 51. General Curvilinear Systems 52. Magnetic Sector Fields 53. Unified Theories of Ion Optical Systems
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