Metric Pattern Cutting for Menswear 5e

Since the first edition was published in 1980, Metric Pattern Cutting for Menswear has become established as the standard work on this subject and has proved invaluable as both a textbook for students and a reference source for the practising designer.

In this fifth edition, the chapter on computer aided design now has full colour illustrations and reflects the growing importance of CAD to the industry and as a part of fashion and design courses. The rest of the book has been updated where necessary: in particular, new blocks for tailored shirts, new details on how to adapt men's blocks for women's wear, and a revision of sizing and labelling information. Colour is now used to differentiate the main groups of patterns and with its tried and tested layout with clear text and diagrams, Metric Pattern Cutting for Menswear is an essential purchase for students of fashion and design.

Since its first publication in 1980, Metric Pattern Cutting for Menswear has fast become the established and authoritative work for students and practicing designers.  This fifth edition has been produced in colour for easier reference and includes revised and updated patterns. The extended final chapter has also been updated with the latest technological advances in CAD. Part one covers flat' blocks and pattern adaptation for a wide range of garments for leisurewear, workwear and nightwear. Part two covers the pattern cutting of the basic sleeves and collars. Part three demonstrates 'form' pattern cutting. Part four includes simple grading techniques and altering patterns to fit the individual figure. Part five illustrates the latest software offered by CAD suppliers for the menswear trade. Metric Pattern Cutting for Menswear provides a simple, flexible system of pattern. It offers you the opportunity to be inventive and produce well-cut designs. It includes a wide variety of casual wear blocks and many blocks for traditional menswear shapes, for example, a variety of suit and shirt blocks, but it still concentrates on illustrating pattern adaptation.