Emerging Technologies For In Situ Processing - Ehrlich D.J. (Curatore); Van Tran Nguyen (Curatore) | Libro Springer 09/2011 - HOEPLI.it


home libri books ebook dvd e film top ten sconti 0 Carrello


Torna Indietro

ehrlich d.j. (curatore); van tran nguyen (curatore) - emerging technologies for in situ processing

Emerging Technologies for In Situ Processing

;




Disponibilità: Normalmente disponibile in 15 giorni


PREZZO
67,98 €
NICEPRICE
64,58 €
SCONTO
5%



Questo prodotto usufruisce delle SPEDIZIONI GRATIS
selezionando l'opzione Corriere Veloce in fase di ordine.


Pagabile anche con App18 Bonus Cultura e Carta Docenti


Facebook Twitter Aggiungi commento


Spese Gratis

Dettagli

Genere:Libro
Lingua: Inglese
Editore:

Springer

Pubblicazione: 09/2011
Edizione: Softcover reprint of the original 1st ed. 1988





Sommario

1. In-Situ Processing Combining MBE, Lithography and Ion-Implantation.- 2. Motivations and Early Demonstrations for In-Situ Processings For III-V Semiconductor Devices.- 3. Laser Etching and Microelectronic Applications.- 4. Laser-Induced Chemical Processing of Materials.- 5. High Technology Manufacturing: Critical Issues for the Future.- 6. Ultra High Vacuum Processing: MBE.- 7. Epitaxial Growth of III-V Materials on Implanted III-V Substrates.- 8. Mechanisms of Laser-Induced Deposition from the Gas Phase.- 9. Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition of Platinum.- 10. Excimer Laser Projection Patterning.- 11. Excimer Laser Patterning and Etching of Metals.- 12. Ion Projection Lithography.- 13. UV Light-Assisted Deposition of A1 on Si from TMA.- 14. E-Beam Induced Decomposition of Inorganic Solids.- 15. Electronic Connection Through Silicon Wafers.- 16. The Development and Use of Novel Precursors for Photolytic Deposition of Dielectric Films.- 17. Focused Ion Beam Induced Deposition.- 18. Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks.- 19. Confirmation of the Wavelength Dependence of Silicon Oxidation Induced By Visible Radiation.- 20. Focused Ion Beam Technology and Applications.- 21. Laser Direct Writing for Device Applications.- 22. Laser-Induced Photoetching of Semiconductors with Chlorine.- 23. Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication.- 24. Synthesis and Characterization of Laser Driven Powders.- 25. Physical Properties of Laser Written Chromium Oxide Thin Films.- 26. UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime.- 27. Laser Assisted Plasma Etching of Silicon Dioxide.- 28. Nd: Yag Laser Processing for Circuit modification and Direct Writing of Silicon Conductors.- 29. Study of Excimer laser Enhanced Etching of Copper and Silicon With (SUB) Monolayer Coverages of Chlorine.- 30. Surface Chemical Probes and Their Application to the Study of In Situ Semicmductor Processing.




Trama

Proceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 1987







Altre Informazioni

ISBN:

9789401071307

Condizione: Nuovo
Collana: Nato Science Series E:
Dimensioni: 235 x 155 mm Ø 468 gr
Formato: Brossura
Pagine Arabe: 304






Utilizziamo i cookie di profilazione, anche di terze parti, per migliorare la navigazione, per fornire servizi e proporti pubblicità in linea con le tue preferenze. Se vuoi saperne di più o negare il consenso a tutti o ad alcuni cookie clicca qui. Chiudendo questo banner o proseguendo nella navigazione acconsenti all’uso dei cookie.

X